Pattern fidelity in nanoimprinted films using CD-SAXS

Pattern fidelity in nanoimprinted films using CD-SAXS

著者名:

Gehoski, K. A. ( Motorola (USA) )

Resnick, D. J. ( Motorola (USA) )

Dauksher, W. J. ( Motorola (USA) )

Nordquist, K. J. ( Motorola (USA) )

Ainley, E. ( Motorola (USA) )

McCord, M. ( KLA-Tencor (USA) )

Raphaelian, M. ( KLA-Tencor (USA) )

Hess, H. ( KLA-Tencor (USA) )

さらに 3 件

掲載資料名:

Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5751

発行年:

2005

開始ページ:

415

終了ページ:

422

総ページ数:

8

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819457318 [0819457310]

言語:

英語

請求記号:

P63600/5751-1

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014972
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging lithographic technologies
回次:	2005 : 9th
会議開催地:	San Jose, CA, USA
会議開催年:	2005.03.01-2005.03.03

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2 国際会議録 Sub-80-nm contact hole patterning using Step and Flash Imprint Lithography Mancini, D.P., Le, N., Gehoski, K.A., Young, S., Dauksher, W.J., Nordquist, K.J., Resnick, D.J. SPIE - The International Society of Optical Engineering	8 国際会議録 Imprint technology: a potential low-cost solution for sub-45 nm device applications [6151-93] Le, N. V., Dauksher, W. J., Gehoski, K. A., Nordquist, K. J., Ainley, E., Mangat, P. SPIE - The International Society of Optical Engineering
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