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Perfluoropolyethers as novel materials for soft lithography

著者名:
Reuther, F. ( micro resist technology GmbH (Germany) )
Kubenz, M. ( micro resist technology GmbH (Germany) )
Schuster, C. ( micro resist technology GmbH (Germany) )
Fink, M. ( micro resist technology GmbH (Germany) )
Vogler, M. ( micro resist technology GmbH (Germany) )
Gruetzner, G. ( micro resist technology GmbH (Germany) )
Grimm, J. ( Westsaechsische Hochschule Zwickau (Germany) )
Kaeppel, A. ( Westsaechsische Hochschule Zwickau (Germany) )
さらに 3 件
掲載資料名:
Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5751
発行年:
2005
開始ページ:
410
終了ページ:
414
総ページ数:
5
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457318 [0819457310]
言語:
英語
請求記号:
P63600/5751-1
資料種別:
国際会議録

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