Uniformity-improving dummy structures for deep reactive ion etching (DRIE) processes
- 著者名:
- Jensen, S. ( Technical Univ. of Denmark (Denmark) )
- Jensen, J.M. ( Technical Univ. of Denmark (Denmark) )
- Quaade, U.J. ( Technical Univ. of Denmark (Denmark) )
- Hansen, O. ( Technical Univ. of Denmark (Denmark) )
- 掲載資料名:
- Micromachining and Microfabrication Process Technology X
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5715
- 発行年:
- 2005
- 開始ページ:
- 39
- 終了ページ:
- 46
- 総ページ数:
- 8
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819456892 [0819456896]
- 言語:
- 英語
- 請求記号:
- P63600/5715
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
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SPIE-The International Society for Optical Engineering |
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4
国際会議録
Characterization and Modeling of Wafer and Die Level Uniformity in Deep Reactive Ion Etching (DRIE)
Materials Research Society |
SPIE-The International Society for Optical Engineering |
Electrochemical Society |
MRS - Materials Research Society |
Electrochemical Society |
SPIE-The International Society for Optical Engineering |