Surface morphology and recrystallization behavior of amorphous Si after ArF laser-irradiation

Surface morphology and recrystallization behavior of amorphous Si after ArF laser-irradiation

著者名:

Chen, T.T. ( Chung Cheng Institute of Technology (Taiwan) )

Chang, C.Y. ( Chung Cheng Institute of Technology (Taiwan) )

Chao, C.L. ( Tam-Kang Univ. (Taiwan) )

Ma, K.J. ( Chung-Hua Univ. (Taiwan) )

Liu, Y.M. ( Chung Cheng institute of Technology (Taiwan) )

Chen, Y.T. ( Chung Cheng institute of Technology (Taiwan) )

Lin, C.W. ( Ta-Tung Univ. (Taiwan) )

さらに 2 件

掲載資料名:

Photon Processing in Microelectronics and Photonics IV

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5713

発行年:

2005

開始ページ:

82

終了ページ:

89

総ページ数:

8

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819456878 [081945687X]

言語:

英語

請求記号:

P63600/5713

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014930
シリーズID:	PA00000029
会議名:	SPIE LASE : Photon processing in microelectronics and photonics
回次:	2005 : 4th
会議開催地:	San Jose, CA, USA
会議開催年:	2005.01.24-2005.01.27

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