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Self-assembled silicon nanostructure growth by electron beam annealing

著者名:
Johnson, S. ( Institute of Geological and Nuclear Sciences Ltd. (New Zealand) )
Markwitz, A. ( Institute of Geological and Nuclear Sciences Ltd. (New Zealand) and MacDiarmid Institute for Advanced Materials and Nanotechnology (New Zealand) )
Rudolphi, M. ( J. W. Goethe Univ. (Germany) )
Baumann, H. ( J. W. Goethe Univ. (Germany) )
Kuo, P.-Y. ( Univ. of Canterbury (New Zealand) )
Blaikie, R. ( MacDiarmid Institute for Advanced Materials and Nanotechnology (New Zealand) and Univ. of Canterbury (New Zealand) )
さらに 1 件
掲載資料名:
Smart materials III : 13-15 December 2004, Sydney, Australia
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5648
発行年:
2004
開始ページ:
294
終了ページ:
300
総ページ数:
7
出版情報:
Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819456083 [081945608X]
言語:
英語
請求記号:
P63600/5648
資料種別:
国際会議録

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