Improving the performance of E-beam 2nd writing in mask alignment accuracy and pattern faultless for CPL technology
- 著者名:
Lee, B. ( Toppan Chunghwa Electronics Corp. (Taiwan, China) ) Hung, R. ( Nanya Technology Corp. (Taiwan) ) Lin, O. ( Toppan Chunghwa Electronics Corp. (Taiwan, China) ) Wu, Y.-H. ( Nanya Technology Corp. (Taiwan, China) ) Kozuma, M. ( Toppan Chunghwa Electronics Corp. (Taiwan, China) ) Shih, C.-L. ( Nanya Technology Corp. (Taiwan, China) ) Hsu, M. ( ASML MaskTools, Inc. (USA) ) Hsu, S. D. ( ASML MaskTools, Inc. (USA) ) - 掲載資料名:
- Advanced microlithography technologies : 8-10 November, 2004, Beijing, China
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5645
- 発行年:
- 2004
- 開始ページ:
- 114
- 終了ページ:
- 121
- 総ページ数:
- 8
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819456007 [0819456004]
- 言語:
- 英語
- 請求記号:
- P63600/5645
- 資料種別:
- 国際会議録
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11
国際会議録
The Performance of pasitive and negative CAR mask exposed by Leica 20 KeV writing system [6281-27]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |