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Intensity distribution topography on pupil's image in EPR

著者名:
  • Li, X. ( Shanghai Univ. of Science and Technology (China) )
  • Liu, H. ( Shanghai Univ. of Science and Technology (China) )
  • Ye, H. ( Shanghai Univ. of Science and Technology (China) )
  • Chen, J. ( Shanghai Univ. of Science and Technology (China) )
掲載資料名:
Optical design and testing II : 8-12 November 2004, Beijing, China
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5638
発行年:
2004
開始ページ:
27
終了ページ:
35
総ページ数:
9
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819455932 [0819455938]
言語:
英語
請求記号:
P63600/5638-1
資料種別:
国際会議録

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