Interferometric lithography at 46.9 nm

Interferometric lithography at 46.9 nm

著者名:

Capeluto, M. G. ( Univ. de Buenos Aires (Argentina) )

Vaschenko, G. O. ( Colorado State Univ. (USA) )

Grisham, M. E. ( Colorado State Univ. (USA) )

Marconi, M. C. ( Univ. de Buenos Aires (Argentina) and Colorado State Univ. (USA) )

Menoni, C. S. ( Colorado State Univ. (USA) )

Rocca, J. J. ( Colorado State Univ. (USA) )

Luduena, S. ( Univ. de Buenos Aires (Agrentina) )

Pietrasanta, L. ( Univ. de Buenos Aires (Agrentina) )

さらに 3 件

掲載資料名:

RIAO/OPTILAS 2004: 5th Iberoamerican meeting on optics and 8th Latin American meeting on optics, lasers, and their applications: ICO regional meeting : 3-8 October 2004, Porlamar, Isla de Margarita, Venezuela

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5622

発行年:

2004

開始ページ:

735

終了ページ:

738

総ページ数:

4

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819455758 [081945575X]

言語:

英語

請求記号:

P63600/5622-2

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014829
シリーズID:	PA00000029
会議名:	RIAO/OPTILAS 2004 ; Iberoamerican Meeting on optics ; Latin American Meeting on Optics, Lasers, and their Applications ; ICO Regional Meeting
回次:	2004 ; 5th ; 8th ; 2004
会議開催地:	Porlamar, Isla de Margarita, Venezuela
会議開催年:	2004.10.03-2004.10.08

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