Enhanced model-based OPC for 65 nm and below

Enhanced model-based OPC for 65 nm and below

著者名:

Word V, J. ( Mentor Graphics Corp. (USA) )
Cobb, N. B. ( Mentor Graphics Corp. (USA) )

掲載資料名:

24th Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5567

発行年:

2004

開始ページ:

1305

終了ページ:

1314

総ページ数:

10

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819455130 [081945513X]

言語:

英語

請求記号:

P63600/5567-2

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014770
シリーズID:	PA00000029
会議名:	Annual BACUS Symposium on Photomask Technology
回次:	2004 : 24th
会議開催地:	Monterey, CA, USA
会議開催年:	2004.09.14-2004.09.17

類似資料:

1 国際会議録 Dense OPC for 65nm and below [5992-181] Coob, N. B., Mentor Graphics Corp. (USA) SPIE - The International Society of Optical Engineering	7 国際会議録 Model-based OPC considering process window aspects: a study Schulze, S.F., Park, O., Zimmermann, R., Chen, M.-J., LaCour, P., Sahouria, E.Y., Granik, Y., Cobb, N. SPIE-The International Society for Optical Engineering
2 国際会議録 Model-based OPC using the MEEF matrix Cobb, N,B,, Granik, Y. SPIE-The International Society for Optical Engineering	8 国際会議録 Toward standard process models for OPC Y. Granik, D. Medvedev, N. Cobb SPIE - The International Society of Optical Engineering
3 国際会議録 New process models for OPC at sub-90-nm nodes Granik, Y., Cobb, N.B. SPIE-The International Society for Optical Engineering	9 国際会議録 OPC structures for maskshops qualification for the CMOS65nm and CMOS45nm nodes F. Sundermann, Y. Trouiller, J. Urbani, C. Couderc, J. Belledent, A. Borjon, F. Foussadier, C. Gardin, L. LeCam, Y. … SPIE - The International Society of Optical Engineering
4 国際会議録 Combining OPC and design for printability into 65-nm logic designs Lucas, K.D., Yuan, C.-M., Boone, R., Strozewski, K., Porter, J., Tian, R., Wimmer, K., Cobb, J., Wilkinson, B., Toublan, … SPIE - The International Society of Optical Engineering	10 国際会議録 Improving model-based OPC performance for the 65-nm node through calibration set optimization Patterson, K., Trouiller, Y., Lucas, K., Belledent, J., Borjon, A., Rody, Y., Couderc, C., Sundermann, F., Urbani, J. … SPIE - The International Society of Optical Engineering
5 国際会議録 Universal process modeling with VTRE for OPC Granik, Y., Cobb, N., Do, T. SPIE-The International Society for Optical Engineering	11 国際会議録 Flexible MRC rules for OPC Cobb, N. B., Miloslavsky, E., Lippincott, G. SPIE - The International Society of Optical Engineering
6 国際会議録 Dense OPC and verification for 45nm [6154c18] Cobb, N., Dudau, D. SPIE - The International Society of Optical Engineering	12 国際会議録 Study toward model-based DRC verification [5992-121] Torres, J. A., Cobb, N. SPIE - The International Society of Optical Engineering

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