Flexible MRC rules for OPC

Flexible MRC rules for OPC

著者名:

Cobb, N. B. ( Mentor Graphics Corp. (USA) )
Miloslavsky, E. ( Mentor Graphics Corp. (USA) )
Lippincott, G. ( Mentor Graphics Corp. (USA) )

掲載資料名:

24th Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5567

発行年:

2004

開始ページ:

1296

終了ページ:

1304

総ページ数:

9

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819455130 [081945513X]

言語:

英語

請求記号:

P63600/5567-2

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014770
シリーズID:	PA00000029
会議名:	Annual BACUS Symposium on Photomask Technology
回次:	2004 : 24th
会議開催地:	Monterey, CA, USA
会議開催年:	2004.09.14-2004.09.17

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