Printability evaluation for 800-nm contact hole with repaired patterns according to exposing condition
- 著者名:
Kim, S. P. ( Hynix Semiconductor, Inc. (South Korea) ) Kim, S. C. ( Hynix Semiconductor, Inc. (South Korea) ) Kim, H. C. ( Hynix Semiconductor, Inc. (South Korea) ) Lee, S. I. ( Hynix Semiconductor, Inc. (South Korea) ) Choi, Y. K. ( Hynix Semiconductor, Inc. (South Korea) ) Han, O. ( Hynix Semiconductor, Inc. (South Korea) ) - 掲載資料名:
- 24th Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5567
- 発行年:
- 2004
- 開始ページ:
- 1091
- 終了ページ:
- 1098
- 総ページ数:
- 8
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819455130 [081945513X]
- 言語:
- 英語
- 請求記号:
- P63600/5567-2
- 資料種別:
- 国際会議録
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