Closing the defect printability loop: optimizing defect specifications for an established lithographic process

Closing the defect printability loop: optimizing defect specifications for an established lithographic process

著者名:

Patterson, K. ( Freescale Semiconducteurs Ctr. de Recherches Crolles SAS (France) )

Wakefield, C. ( Photronics, Inc. (United Kingdom) )

Sixt, P. ( Photronics, Inc. (France) )

Sundermann, F. ( STMicroelectronics (France) )

Trouiller, Y. ( CEA-LETI (France) )

Belledent, J. ( Philips Semiconductors (France) )

Couderc, C. ( Philips Semiconductors (France) )

Rody, Y. ( Philips Semiconductors (France) )

Lucas, K. ( Freescale Semiconducteurs Ctr. de Recherches Crolles SAS (France) )

さらに 4 件

掲載資料名:

24th Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5567

発行年:

2004

開始ページ:

1076

終了ページ:

1082

総ページ数:

7

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819455130 [081945513X]

言語:

英語

請求記号:

P63600/5567-2

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014770
シリーズID:	PA00000029
会議名:	Annual BACUS Symposium on Photomask Technology
回次:	2004 : 24th
会議開催地:	Monterey, CA, USA
会議開催年:	2004.09.14-2004.09.17

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1 国際会議録 Improving model-based OPC performance for the 65-nm node through calibration set optimization Patterson, K., Trouiller, Y., Lucas, K., Belledent, J., Borjon, A., Rody, Y., Couderc, C., Sundermann, F., Urbani, J. … SPIE - The International Society of Optical Engineering	7 国際会議録 Correction of long-range effects applied to the 65-nm node [5853-107] Belledent, J., Word, J., Trouiller, Y., Couderc, C., Miramond, C., Toublan, O., Chapon, J.-D., Baron, S., Borjon, A., … SPIE - The International Society of Optical Engineering
2 国際会議録 Process window OPC verification: dry versus immersion lithography for the 65 nm node [6154-169] Borjon, A., Belledent, J., Trouiller, Y., Lucas, K., Couderc, C., Sundermann, F., Urbani, J. C., Rody, Y., Gardin, G., … SPIE - The International Society of Optical Engineering	8 国際会議録 Investigation of model-based physical design restrictions(Invited Paper) Lucas, K., Baron, S., Belledent, J., Boone, R., Borjon, A., Couderc, C., Patterson, K., Riviere-Cazaux, L., Rody, Y., … SPIE - The International Society of Optical Engineering
3 国際会議録 MEV as a new constraint for lithographers in the sub-100-nm regime Trouiller, Y., Postnikov, S.V., Lucas, K.D., Sundermann, F., Patterson, K., Belledent, J., Couderc, C., Rody, Y.F. SPIE - The International Society of Optical Engineering	9 国際会議録 Through-process window resist modelling strategies for the 65 nm node [5992-46] Borjon, A., Belledent, J., Troullier, Y., Patterson, K., Lucas, K., Couderc, C., Sundermann, F., Urbani, J. -C., Baron, … SPIE - The International Society of Optical Engineering
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