Comparative study of mask architectures for EUV lithography

Comparative study of mask architectures for EUV lithography

著者名:

Pawloski, A. R. ( Advanced Micro Devices, Inc. (USA) )

La Fontaine, B. ( Advanced Micro Devices, Inc. (USA) )

Levinson, H. J. ( Advanced Micro Devices, Inc. (USA) )

Hirscher, S. ( Infineon Technologies AG (Germany) )

Schwarzl, S. ( Infineon Technologies AG (Germany) )

Lowack, K. ( Infineon Technologies AG (Germany) )

Kamm, F. -M. ( Infineon Technologies AG (Germany) )

Bender, M. ( Infineon Technologies AG (Germany) )

Domke, W. -D. ( Infineon Technologies AG (Germany) )

Holfeld, C. ( Advanced Mask Technology Ctr. GmbH & Co. KG (Germany) )

Dersch, U. ( Advanced Mask Technology Ctr. GmbH & Co. KG (Germany) )

Naulleau, P. ( Lawrence Berkeley National Lab. (USA) )

Letzkus, F. ( IMS Chips (Germany) )

Butschke, J. ( IMS Chips (Germany) )

さらに 9 件

掲載資料名:

24th Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5567

発行年:

2004

開始ページ:

762

終了ページ:

773

総ページ数:

12

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819455130 [081945513X]

言語:

英語

請求記号:

P63600/5567-2

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014770
シリーズID:	PA00000029
会議名:	Annual BACUS Symposium on Photomask Technology
回次:	2004 : 24th
会議開催地:	Monterey, CA, USA
会議開催年:	2004.09.14-2004.09.17

類似資料:

1 国際会議録 Defect printability study using EUV lithography [6151-30] Holfeld, C., Bubke, K, Lehmann, F., La Fontaine, B., Pawloski, A.. R., Schwarzl, S., Kamm, F M, Graf T, Erdmann, A SPIE - The International Society of Optical Engineering	7 国際会議録 EUV mask making: an approach based on the direct patterning of the EUV reflector Chovino, C., Dieu, L., Johnstone, E., Reyes, J., La Fontaine, B.M., Levinson, H.J., Pawloski, A.R. SPIE - The International Society of Optical Engineering
2 国際会議録 Demonstration of phase-shift masks for extreme-ultraviolet lithography [6151-10] La Fontaine, B., Pawloski, A. R., Wood, O., Deng, Y., Levinson, H. J., Naulleau, P., Denham, P. E., Gullikson, E., Hoef, … SPIE - The International Society of Optical Engineering	8 国際会議録 EUVL mask manufacturing: technologies and results [5992-83] Letzkus, F., Butschke, J., Irmscher, M., Sailer, H., Dersch, U., Holfield, C. SPIE - The International Society of Optical Engineering
3 国際会議録 Optimized processes and absorber-stack materials for EUV masks Mathuni, J., Rau, J., Kamm, F. -M., Ruhl, G. G., Holfeld, Ch., Letzkus, F., Kopernik, C., Butschke, J. SPIE - The International Society of Optical Engineering	9 国際会議録 Absorber stack optimization toward EUV lithography mask blank pilot production Sobel, F., Aschke, L., Renno, M., Seitz, H., Becker, H. W., Olschewski, N., Reichardt, T., Hess, G., Buttgereit, U., … SPIE - The International Society of Optical Engineering
4 国際会議録 Architectural choices for EUV lithography masks: patterned absorbers and patterned reflectors La Fontaine, B., Pawloski, A.R., Deng, Y., Chovino, C., Dieu, L., Wood, O.R., II, Levinson, H.J. SPIE - The International Society of Optical Engineering	10 国際会議録 Numerical and experimental study of oxide growth on EUV mask capping layers Cotte, E. P., Holfeld, C., Dersch, U., Ruhl, G., Perlich, J. SPIE - The International Society of Optical Engineering
5 国際会議録 Manufacturing of the first EUV full-field scanner mask [6349-90] Dersch, U., Buettner, R., Chovino, C., Franz, S., Heins, T., Herguth, H., Peters, J. H., Rode, T., Letzkus, F., … SPIE - The International Society of Optical Engineering	11 国際会議録 Stencil mask technology for ion beam lithography Ehrmann,A., Huber,S., Kasmaier,R., Oelmann,A.B., Struck,T., Springer,R., Butschke,J., Letzkus,F., Kragler,K., … SPIE - The International Society for Optical Engineering
6 国際会議録 SiO2 buffer-etch processes with a TaN absorber for EUV mask fabrication Letzkus, F., Butschke, J., Koepernik, C., Holfeld, C., Mathuni, J., Aschke, L., Sobel, F. SPIE - The International Society of Optical Engineering	12 国際会議録 Influence of antireflection coatings in ArF lithography La Fontaine, B.M., Pawloski, A.R., Acheta, A., Deng, Y., Levinson, H.J., Spence, C., Chovino, C., Dieu, L., Johnstone, … SPIE - The International Society of Optical Engineering

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