![Blank Cover Image](/journaldocs/sites/all/modules/xc/xc_search/images/blank_cover/conference_proceedings.png)
Comparative study of mask architectures for EUV lithography
- 著者名:
Pawloski, A. R. ( Advanced Micro Devices, Inc. (USA) ) La Fontaine, B. ( Advanced Micro Devices, Inc. (USA) ) Levinson, H. J. ( Advanced Micro Devices, Inc. (USA) ) Hirscher, S. ( Infineon Technologies AG (Germany) ) Schwarzl, S. ( Infineon Technologies AG (Germany) ) Lowack, K. ( Infineon Technologies AG (Germany) ) Kamm, F. -M. ( Infineon Technologies AG (Germany) ) Bender, M. ( Infineon Technologies AG (Germany) ) Domke, W. -D. ( Infineon Technologies AG (Germany) ) Holfeld, C. ( Advanced Mask Technology Ctr. GmbH & Co. KG (Germany) ) Dersch, U. ( Advanced Mask Technology Ctr. GmbH & Co. KG (Germany) ) Naulleau, P. ( Lawrence Berkeley National Lab. (USA) ) Letzkus, F. ( IMS Chips (Germany) ) Butschke, J. ( IMS Chips (Germany) ) - 掲載資料名:
- 24th Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5567
- 発行年:
- 2004
- 開始ページ:
- 762
- 終了ページ:
- 773
- 総ページ数:
- 12
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819455130 [081945513X]
- 言語:
- 英語
- 請求記号:
- P63600/5567-2
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
4
![]() SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |