Blank Cover Image

Effect of UV/O3 treatment on mask surface to reducing sulfuric residue ions

著者名:
Lee, D. W. ( Hynix Semiconductor, Inc. (South Korea) )
Jung, H. Y. ( Hynix Semiconductor, Inc. (South Korea) )
Kim, M. S. ( Hynix Semiconductor, Inc. (South Korea) )
Lee, J. S. ( Hynix Semiconductor, Inc. (South Korea) )
Choi, Y. K. ( Hynix Semiconductor, Inc. (South Korea) )
Han, O. ( Hynix Semiconductor, Inc. (South Korea) )
さらに 1 件
掲載資料名:
24th Annual BACUS Symposium on Photomask Technology
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5567
発行年:
2004
開始ページ:
521
終了ページ:
528
総ページ数:
8
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819455130 [081945513X]
言語:
英語
請求記号:
P63600/5567-1
資料種別:
国際会議録

類似資料:

1 国際会議録 Investigation of Cr defect in high Cr load logic mask

Jung, H.-Y., Choi, S.J., Kim, M.-S., Lee, D.W., Lee, J., Han, O.

SPIE - The International Society of Optical Engineering
7 国際会議録 Design and properties of new deep-UV positive photoresist

Choi,S.-J., Jung,S.-Y., Kim,C.-H., Park,C.-G., Han,W.-S., Koh,Y.-B., Lee,M.-Y.

SPIE-The International Society for Optical Engineering
2 国際会議録 Dehydration bake effects with UV/O3 treatment for 130-nm node PSM processing

Kim, Y.-D., Lee, D.-S., Park, D.-I., Kwon, H.-J., Kim, J.-M., Jung, S.-M., Choi, S.-S.

SPIE - The International Society of Optical Engineering
8 国際会議録 Simulation of mask induced polarization effect on imaging in immersion lithography [6154-105]

Kwak, E. A., Jung, M. R., Kim, D.-G., Lee, J.-E., Oh, H.-K., Lee, S.

SPIE - The International Society of Optical Engineering
3 国際会議録 Effect of mask reduction ratio in alternating phase-shift masks

Shin,I.-G., Lee,S.-W., Kim,Y.-H., Choi,S.-W., Han,W.-S., Sohn,J.-M., Lim,T.-K.

SPIE-The International Society for Optical Engineering
9 国際会議録 EUV mask pattern inspection for memory mask fabrication in 45-nm node and below [6349-95]

Kim, D. Y., Cho, S. Y., Kim, H., Huh, S. M., Chung, D. H., Cha, B. C., Lee, J. W., Choi, S. W., Han, W. S., Park, K. H., …

SPIE - The International Society of Optical Engineering
4 国際会議録 Optical performance enhancement technique for 45-nm-node with binary mask

J. Jung, H. Kim, J. Lee, S. Choi, W. Han

SPIE - The International Society of Optical Engineering
10 国際会議録 Study of the beam blur and its effect on the future mask fabrication [6349-33]

Lee, S., Park, S., Ahn, M., Doh, J., Kim, S., Kim, B., Choi, S., Han, W.

SPIE - The International Society of Optical Engineering
5 国際会議録 Defects analysis of mask blanks

Lee,D.H., Kim,D.W., Lee,J.K., Jeong,W.G., Choi,S.-S., Jung,S.-M., Jeong,S.-H.

SPIE-The International Society for Optical Engineering
11 国際会議録 Vacuum delay effect of CAR in mask fabrication

Kim,C.-H., Jeon,C.-U., Han,S.-J., Cho,W.-I., Choi,S.-W., Han,W.-S., Sohn,J.-M.

SPIE-The International Society for Optical Engineering
6 国際会議録 Analysis of dry etch loading effect in mask fabrication

Lee,J.-Y., Cho,S.-Y., Kim,C.-H., Lee,S.-W., Choi,S.-W., Han,W.-S., Sohn,J.-M.

SPIE-The International Society for Optical Engineering
12 国際会議録 Effects of NH3/N2 Plasma Treatment on Very-Low-Temperature (100℃) Oxides

Kim, C.-H., Jung, S-H., Nam, W.-J., Han, M.-K.

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12