E-beam mask repair: fundamental capability and applications

E-beam mask repair: fundamental capability and applications

著者名:

Liang, T. ( Intel Corp. (USA) )
Frendberg, E. ( Intel Corp. (USA) )
Bald, D. J. ( Intel Corp. (USA) )
Penn, M. ( Intel Corp. (USA) )
Stivers, A. R. ( Intel Corp. (USA) )

掲載資料名:

24th Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5567

発行年:

2004

開始ページ:

456

終了ページ:

466

総ページ数:

11

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819455130 [081945513X]

言語:

英語

請求記号:

P63600/5567-1

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014769
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2004 : 24th
会議開催地:	Monterey, California, USA
会議開催年:	2004.09.14-2004.09.17

類似資料:

1 国際会議録 Demonstration of damage-free mask repair using electron beam-induced processes Liang, T., Stivers, A.R., Penn, M., Bald, D., Sethi, C., Boegli, V., Budach, M., Edinger, K., Spies, P. SPIE - The International Society of Optical Engineering	7 国際会議録 EUV mask process development and integration [6283-91] Zhang, G., Yan, -Y. P., Liang, T., Du, Y., Sanchez, P., Park, S., Lanzendorf, J. E., Choi, J. C., Shu, Y. E., Stivers, … SPIE - The International Society of Optical Engineering
2 国際会議録 Damage-free mask repair using electron-beam-induced chemical reactions Liang, T., Stivers, A.R. SPIE-The International Society for Optical Engineering	8 国際会議録 Application of photolithographic simulation and a mask repair system in a production environment [6283-45] Robinson, T., Lewellen, J., Bozak, R., Lee, A. D., Brooker, P. SPIE - The International Society of Optical Engineering
3 国際会議録 Evaluation of the capability of a multibeam confocal inspection system for inspection of EUVL mask blanks Stivers, A.R., Liang, T., Penn, M.J., Lieberman, B., Shelden, G.V., Folta, J.A., Larson, C.C., Mirkarimi, P.B., Walton, … SPIE-The International Society for Optical Engineering	9 国際会議録 Use of nanomachining for subtractive repair of EUV and other challenging mask defects Brinkley, D., White, R., Bozak, R., Liang, T., Liu, G. SPIE-The International Society for Optical Engineering
4 国際会議録 EUV mask absorber characterization and selection Yan,P., Zhang,G., Kofron,P., Powers,J.E., Tran,M., Liang,T., Stivers,A.R., Lo,F.-C. SPIE - The International Society for Optical Engineering	10 国際会議録 Application of mask simulation to mask repair Musil, C.R., Stewart, D.K., Clark, R.F. SPIE-The International Society for Optical Engineering
5 国際会議録 Pattern inspection of EUV masks using DUV light Liang, T., Tejnil, E., Stivers, A.R. SPIE-The International Society for Optical Engineering	11 国際会議録 EUV mask pilot line at Intel Corporation (Keynote Address) Stivers, A. R., Yan, P. -Y., Zhang, G., Shu, E. Y., Tejnil, E., Lieberman, B., Nagpal, R., Hsia, K., Penn, M., Lo, F. … SPIE - The International Society of Optical Engineering
6 国際会議録 Application of electron-beam-induced processes to mask repair Edinger, K., Boegli, V.A., Budach, M., Hoinkis, O., Weyrauch, B., Koops, H.W.P., Bihr, J., Greiser, J. SPIE-The International Society for Optical Engineering	12 国際会議録 EUV mask pattern defect printability [6283-95] Liang, T., Zhang, G., Naulleau, P., Myers, A., Park, -J. S., Stivers, A., Vandentop, G. SPIE - The International Society of Optical Engineering

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