Blank Cover Image

Multilayer and multiproduct masks: cost reduction methodology

著者名:
Balasinski, A. P. ( Cypress Semiconductor Corp. (USA) )  
掲載資料名:
24th Annual BACUS Symposium on Photomask Technology
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5567
発行年:
2004
開始ページ:
351
終了ページ:
359
総ページ数:
9
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819455130 [081945513X]
言語:
英語
請求記号:
P63600/5567-1
資料種別:
国際会議録

類似資料:

1 国際会議録 Device analysis: a way to reduce patterning cost at mask and wafer level?

Balasinski, A. P., Driessen, F. A.

SPIE - The International Society of Optical Engineering
7 国際会議録 Mask manufacturability improvement by MRC

A. Balasinski, D. Coburn, P. Buck

Society of Photo-optical Instrumentation Engineers
2 国際会議録 Mask cost tradeoffs for sub-100-nm technologies: stopping a runaway? (Invited Paper)

Balasinski, A.P.

SPIE-The International Society for Optical Engineering
8 国際会議録 SoC variability evaluation and reduction

A. P. Balasinski, M. C. Smayling, V. Axelrad

Society of Photo-optical Instrumentation Engineers
3 国際会議録 Multi-layer masks: manufacturability considerations [5853-49]

Balasinski, A.

SPIE - The International Society of Optical Engineering
9 国際会議録 DfM requirements and ROI analysis for system-on-chip [5992-15]

Balasinski, A.

SPIE - The International Society of Optical Engineering
4 国際会議録 A methodology to analyze circuit impact of process-related MOSFET geometry

Balasinski, A.

SPIE - The International Society of Optical Engineering
10 国際会議録 Patterning techniques for next generation IC's

A. Balasinski

Society of Photo-optical Instrumentation Engineers
5 国際会議録 Optimization of dummy pattern for mask data size reduction

Iandolo, W., Gilboa, Y., Phan, B., Balasinski, A.P.

SPIE - The International Society of Optical Engineering
11 国際会議録 Mask cost reduction and yield optimization using design intent

Cote, M., Miloslavsky, A., Hurat, P., Rieger, M., Goinard, D.

SPIE - The International Society of Optical Engineering
6 国際会議録 Mask complexity reduction, quality assurance, and yield improvement through reduced layout variability [6349-13]

Balasinski, A., Cetin, J.

SPIE - The International Society of Optical Engineering
12 国際会議録 Intelligent fill pattern and extraction methodology for sensitive RF/analog or SoC products

A. Balasinski, J. Cetin, A. Kahng

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12