FEP-171 resist thickness optimization and dry etch screening on NTAR7 chrome substrates for Sigma7300 DUV laser pattern generator

FEP-171 resist thickness optimization and dry etch screening on NTAR7 chrome substrates for Sigma7300 DUV laser pattern generator

著者名:

Karlsson, J. O. ( Micronic Laser Systems AB (Sweden) )

Xing, K. ( Micronic Laser Systems AB (Sweden) )

Bajramovic, A. ( Micronic Laser Systems AB (Sweden) )

Dahlberg, H. ( Micronic Laser Systems AB (Sweden) )

Bjornberg, C. ( Micronic Laser Systems AB (Sweden) )

Hogfeldt, P. ( Micronic Laser Systems AB (Sweden) )

Kjellberg, L. ( Micronic Laser Systems AB (Sweden) )

Fosshaug, H. ( Micronic Laser Systems AB (Sweden) )

Dahlberg, A. ( Micronic Laser Systems AB (Sweden) )

Lundvall, A. ( Micronic Laser Systems AB (Sweden) )

さらに 5 件

掲載資料名:

24th Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5567

発行年:

2004

開始ページ:

234

終了ページ:

244

総ページ数:

11

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819455130 [081945513X]

言語:

英語

請求記号:

P63600/5567-1

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014769
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2004 : 24th
会議開催地:	Monterey, California, USA
会議開催年:	2004.09.14-2004.09.17

類似資料:

1 国際会議録 High performance FEP-171 resist process in combination with NTAR7 and NTAR5 chrome and the Sigma7300 DUV mask writer [5853-04] Xing, K., Karlsson, J., Paulson, A., Bjornberg, C., Lundvall, A., Hogfeldt, P., Vedenpaa, J., Goodoree, R., Bjuggren, M. SPIE - The International Society of Optical Engineering	7 国際会議録 Anti-bubble topcoat for immersion lithography Paulsson, A., Xing, K., Fosshaug, H., Lundvall, A., Bjornberg, C., Karlsson, J. SPIE - The International Society of Optical Engineering
2 国際会議録 Influence of writing strategy on CD control for the spatial-light-modulator-based Sigma7300 DUV laser pattern generator Fosshaug, H., Askebjer, P., Karlsson, J., Bajramovic, A., Xing, K., Eklund, R., Walford, J., Ekberg, M., Hogfeldt, P., … SPIE - The International Society of Optical Engineering	8 国際会議録 Airborne molecular contamination control in the micromirror SLM-based deep ultraviolet DUV SIGMA7300 laser pattern generator Ekberg, M., Fosshaug, H.A., Ostrom, T., Bjornangen, P., Utterback, T., Skotte, P.-U., Higley, J., Ruede, D., Kishkovich, … SPIE - The International Society of Optical Engineering
3 国際会議録 Resist process optimization for a DUV laser pattern generator Fosshaug, H.A., Bajramovic, A., Karlsson, J., Xing, K., Rosendahl, A., Dahlberg, A., Bjoernberg, C., Bjuggren, M., … SPIE - The International Society of Optical Engineering	9 国際会議録 Pattern accuracy and throughput optimization for an SLM-based 248-nm DUV laser mask pattern generator Sjoberg, H., Chauvet, J.-M., Harkesjo, J., Hogfeldt, P., Karawajczyk, A., Karlsson, J., Kjellberg, L., Mahlen, J., … SPIE - The International Society of Optical Engineering
4 国際会議録 Managing effects in CD control from PED and PEB in advanced DUV photomask manufacturing using FEP-171 resist Adisa Paulsson, Kezhao Xing, Hans Fosshaug, Axel Lundvall, Charles Bjoernberg, Johan Karlsson SPIE - The International Society of Optical Engineering	10 国際会議録 Properties of a 248-nm DUV laser mask pattern generator for the 90-nm and 65-nm technology nodes Aman, J., Fosshaug, H.A., Hedqvist, T., Harkesjo, J., Hogfeldt, P., Jacobsson, M., Karawajczyk, A., Karlsson, J., … SPIE - The International Society of Optical Engineering
5 国際会議録 Evaluation of attenuated PSM photomask blanks with TF11 chrome and FEP-171 resist on a 248 nm DUV laser pattern generator K. Xing, C. Björnborg, H. Karlsson, A. Paulsson, A. Rosendahl Society of Photo-optical Instrumentation Engineers	11 国際会議録 Evaluation of TF11 attenuated-PSM mask blanks with DUV laser patterning K. Xing, C. Björnberg, H. Karlsson, A. Paulsson, P. Beiming Society of Photo-optical Instrumentation Engineers
6 国際会議録 DOE manufacture with the DUV SLM-based Sigma7300 laser pattern generator Bjyrnyngen, P., Ekberg, M., ystrym, T., Fosshaug, H.A., Karlsson, J., Bjyrnberg, C., Nikolajeff, F.K., Karlsson, M. SPIE - The International Society of Optical Engineering	12 国際会議録 PSM alignment for Sigma7300: signal quality and resist effects from using the writing DUV laser light spatial light modulator and a CCD camera as measurement … Ostrom, T., Lindau, S., Ekberg, M., Fosshaug, H.A., Zerne, R. SPIE - The International Society of Optical Engineering

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