Blank Cover Image

Reduction of radial CD errors and Cr loading effects in 90-nm binary NCAR mask process through chrome etch DOE

著者名:
Ma, J. ( Intel Corp. (USA) )
Li, C. ( Intel Corp. (USA) )
Bassist, L. ( Intel Corp. (USA) )
Pekney, M. ( Intel Corp. (USA) )
Wilcox, N. ( Intel Corp. (USA) )
Farnsworth, J. ( Intel Corp. (USA) )
Lauder, E. ( Intel Corp. (USA) )
Krishnakumar, B. ( Intel Corp. (USA) )
さらに 3 件
掲載資料名:
24th Annual BACUS Symposium on Photomask Technology
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5567
発行年:
2004
開始ページ:
167
終了ページ:
175
総ページ数:
9
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819455130 [081945513X]
言語:
英語
請求記号:
P63600/5567-1
資料種別:
国際会議録

類似資料:

1 国際会議録 Development of an automated multiple-target mask CD disposition system to enable new sampling strategy [6152-58]

Ma, J., Farnsworth, J., Bassist, L., Cui, Y., Mammen, B., Padmanaban, R., Nadamuni, V., Kamath, M., Buckmann, K., Neff, …

SPIE - The International Society of Optical Engineering
7 国際会議録 Alt-phase shift mask technology for 65nm logic applications [6154-22]

Chakravorty, K. K., Henrichs, S., Qiu, W., Chavez, J. L., Liu, Y.-P., Ghadiali, F., Yung, K., Wilcox, N., Silva, M., Ma, …

SPIE - The International Society of Optical Engineering
2 国際会議録 Plasma etch of binary Cr masks:CD uniformity study of photomasks utilizing varying Cr loads

Constantine,C., Westerman,R.J., Plumhoff,J.

SPIE - The International Society for Optical Engineering
8 国際会議録 The advanced mask CD MTT control using dry etch process for sub 65 nm tech

S. J. Jo, H. Y. Jung, D. W. Lee, J. C. Shin, J. Y. Jun

Society of Photo-optical Instrumentation Engineers
3 国際会議録 Plasma etch of binary Cr masks: CD uniformity study of photomasks utilizing varying Cr loads: ？

Constantine,C., Westerman,R.J., Plumhoff,J.

SPIE-The International Society for Optical Engineering
9 国際会議録 Impact of mask CD error on OPC performance for 65nm technology M1 level [5992-91]

Park, O., Oberschmidt, J., Li, W. -K.

SPIE - The International Society of Optical Engineering
4 国際会議録 Achieving 65-nm design rule dry etch performance: a study of CD bias, uniformity, and linearity on binary chrome photomasks

Plumhoff, J., Constantine, C., Reelfs, B.H.

SPIE - The International Society of Optical Engineering
10 国際会議録 Binary Cr etch process control directed at the 45nm node [6283-25]

Plumhoff, J., Westernman, R., Constantine, C.

SPIE - The International Society of Optical Engineering
5 国際会議録 Modeling and correction of global CD uniformity caused by fogging and loading effects in 90-nm-node CAR process

Park, D.-I., Park, E.-S., Lee, J.-H., Jeong, W.-G., Seo, S.-K., Kwon, H.-J., Kim, J.-M., Jung, S.-M., Choi, S.-S.

SPIE-The International Society for Optical Engineering
11 国際会議録 Impact of inter-mask CD error on OPC accuracy in resolution of 90 nm and below

Ozawa, K., Sato, S., Ohnuma, H.

SPIE-The International Society for Optical Engineering
6 国際会議録 Alternating phase shift mask architecture scalability, implementations, and applications for 90-nm and 65-nm technology nodes and beyond

Cheng, W.-H., Chakravorty, K.K., Farnsworth, J.N.

SPIE-The International Society for Optical Engineering
12 国際会議録 Monitoring system of CD error analysis for the 90-nm node mask manufacturing [5853-11]

Yu, S.-Y., Kim, S.-H., Cha, B.-C., Kim, Y.-H., Choi, S.-W., Yoon, H.-S., Han, W.-S.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12