Chrome dry etching for 65-nm node mask manufacturing
- 著者名:
- Faure, T. ( IBM Corp. (USA) )
- Fisch, E. ( IBM Corp. (USA) )
- Huynh, C. ( IBM Corp. (USA) )
- Crawford, S. ( IBM Corp. (USA) )
- 掲載資料名:
- 24th Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5567
- 発行年:
- 2004
- 開始ページ:
- 155
- 終了ページ:
- 166
- 総ページ数:
- 12
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819455130 [081945513X]
- 言語:
- 英語
- 請求記号:
- P63600/5567-1
- 資料種別:
- 国際会議録
類似資料:
1
国際会議録
Process monitoring of chrome dry-etching with RF sensor for reticle production beyond 90-nm node
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |