Phase defect printability and mask inspection capability of 65-nm technology node Alt-PSM for ArF lithography (Photomask Japan Best Paper)
- 著者名:
Akima, S. ( Toppan Printing Co., Ltd. (Japan) ) Komizo, T. ( Toppan Printing Co., Ltd. (Japan) ) Kawakita, S. ( Toppan Printing Co., Ltd. (Japan) ) Kodera, Y. ( Toppan Printing Co., Ltd. (Japan) ) Narita, T. ( Toppan Printing Co., Ltd. (Japan) ) Ishikawa, K. ( Sony Corp. (Japan) ) - 掲載資料名:
- 24th Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5567
- 発行年:
- 2004
- 開始ページ:
- 23
- 終了ページ:
- 35
- 総ページ数:
- 13
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819455130 [081945513X]
- 言語:
- 英語
- 請求記号:
- P63600/5567-1
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |