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Phase defect printability and mask inspection capability of 65-nm technology node Alt-PSM for ArF lithography (Photomask Japan Best Paper)

著者名:
Akima, S. ( Toppan Printing Co., Ltd. (Japan) )
Komizo, T. ( Toppan Printing Co., Ltd. (Japan) )
Kawakita, S. ( Toppan Printing Co., Ltd. (Japan) )
Kodera, Y. ( Toppan Printing Co., Ltd. (Japan) )
Narita, T. ( Toppan Printing Co., Ltd. (Japan) )
Ishikawa, K. ( Sony Corp. (Japan) )
さらに 1 件
掲載資料名:
24th Annual BACUS Symposium on Photomask Technology
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5567
発行年:
2004
開始ページ:
23
終了ページ:
35
総ページ数:
13
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819455130 [081945513X]
言語:
英語
請求記号:
P63600/5567-1
資料種別:
国際会議録

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