Determining the transfer function of a mask fabrication process

Determining the transfer function of a mask fabrication process

著者名:

Leunissen, P. L. H. A. ( IMEC(Belgium) )
Philipsen, V. ( IMEC(Belgium) )
Jonckheere, R. M. ( IMEC(Belgium) )

掲載資料名:

20th European Conference on Mask Technology for Integrated Circuits and Microcomponents

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5504

発行年:

2004

開始ページ:

36

終了ページ:

45

総ページ数:

10

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819454379 [0819454370]

言語:

英語

請求記号:

P63600/5504

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014705
シリーズID:	PA00000029
会議名:	European Mask and Lithography Conference : European Conference on Mask Technology for Integrated Circuits and Microcomponents
回次:	2004 : 20th
会議開催地:	Dresden, Germany
会議開催年:	2004.01.12-2004.01.14

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2 国際会議録 Analysis method to determine and characterize the mask mean-to-target and uniformity specification [6281-55] Lee, -W. S., Leunissen, A. H. L., Van de Kerhove, J., Philipsen, V., Jonckheere, R., Lee, -J. S., Woo, -G. S., Cho, -K. … SPIE - The International Society of Optical Engineering	8 国際会議録 Feature proximity errors on mask: assessment results of commercially obtained reticles Jonckheere, R.M., Potoms, G., Philipsen, V. SPIE-The International Society for Optical Engineering
3 国際会議録 Optimizing absorber thickness of attenuating phase-shifting masks for hyper-NA Iithogra phy [6154-51] Yoshizawa, M., Philipsen, V., Leunissen, L. H. A. SPIE - The International Society of Optical Engineering	9 国際会議録 Impact of the absorber thickness variation on the imaging performance of ArF immersion lithography [5853-112] Yoshizawa, M., Philipsen, V., Leunissen, L. H. A. SPIE - The International Society of Optical Engineering
4 国際会議録 Feasibility study of embedded binary masks [6349-21] Cangemi, M., Philipsen, V., Leunissen, L. H. A., Taylor, D. SPIE - The International Society of Optical Engineering	10 国際会議録 Extended defect printability study for 100-nm design rule using 193-nm lithography Philipsen, V., Jonckheere, R.M. SPIE-The International Society for Optical Engineering
5 国際会議録 Through-pitch characterization and printability for 65nm half-pitch alternating aperture phase shift applications [5853-108] Philipsen, V., Leunissen, L., De Ruyter, R., Jonckheere, R., Marlin, P., Wakefield, C., Johnson, S., Cangemi, M., … SPIE - The International Society of Optical Engineering	11 国際会議録 Manufacturability and printability of AAPSM with transparent etch stop layer [6281-54] Cangemi, M., Philipsen, V., De Ruyter, R., Leunissen, L., Morgana, N., Sixt, P., Cottle, R., Kasprowicz, B. SPIE - The International Society of Optical Engineering
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