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Impact of mask CD error on wafer CD error at low-k1 photolithography

著者名:
Kim, B. -G. ( Samsung Electronics Co., Ltd. (Korea) )
Choi, S. -W. ( Samsung Electronics Co., Ltd. (Korea) )
Choi, J. -H. ( Samsung Electronics Co., Ltd. (Korea) )
Chun, C. -U. ( Samsung Electronics Co., Ltd. (Korea) )
Yoon, H. -S. ( Samsung Electronics Co., Ltd. (Korea) )
Sohn, J. -M. ( Samsung Electronics Co., Ltd. (Korea) )
さらに 1 件
掲載資料名:
Photomask and X-Ray Mask Technology VI
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3748
発行年:
1999
開始ページ:
572
終了ページ:
578
総ページ数:
7
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819432308 [081943230X]
言語:
英語
請求記号:
P63600/3748
資料種別:
国際会議録

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