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ArF photoresist system: using cycloolefin-alt-maleic anhydride pericyclic acrylate terpolymers

著者名:
Chang, S. -Y. ( Industrial Technology Research Institute (Taiwan) )
Cheng, K. -L. ( Industrial Technology Research Institute (Taiwan) )
Ho, B. -C. ( Industrial Technology Research Institute (Taiwan) )
Chang, I. -F. ( Industrial Technology Research Institute (Taiwan) )
Chen, J. -H. ( Industrial Technology Research Institute (Taiwan) )
Liu, T. -C. ( Industrial Technology Research Institute (Taiwan) )
Lin, T. -Y. ( Industrial Technology Research Institute (Taiwan) )
さらに 2 件
掲載資料名:
Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3678
発行年:
1999
開始ページ:
1388
終了ページ:
1395
総ページ数:
8
出版情報:
Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819431523 [0819431524]
言語:
英語
請求記号:
P63600/3678-2
資料種別:
国際会議録

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