Antireflective coating strategies for 193-nm lithography

Antireflective coating strategies for 193-nm lithography

著者名:

Stephen, A. ( Advanced Micro Devices, Inc. and International SEMATECH )
Dean, K. R. ( International SEMATECH )
Byers, I. D. ( International SEMATECH )

掲載資料名:

Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3678

発行年:

1999

開始ページ:

1315

終了ページ:

1322

総ページ数:

8

出版情報:

Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819431523 [0819431524]

言語:

英語

請求記号:

P63600/3678-2

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014621
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Microlithography
回次:	1999 : 16th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1999.03.15-1999.03.17

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2 国際会議録 193-nm single-layer process for 150-nm technology generation and below Amblard, G. R., Zandbergen, P., McCallum, M., Stephen, A., Byers, J. D., Dean, K. R., Meute, J., Nelson, C. M. SPIE - The International Society of Optical Engineering	8 国際会議録 Organosiloxane-based bottom antireflective coatings for 193-nm lithography Kennedy, J.T., Baldwin-Hendricks, T., Stuck, J., Suedmeyer, A., Thanawala, S., Do, K., Iwamoto, N.E. SPIE-The International Society for Optical Engineering
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6 国際会議録 Highly etch-selective spin-on bottom antireflective coating for use in 193-nm lithography and beyond Pfeiffer, D., Mahorowala, A.P., Babich, K., Medeiros, D.R., Petrillo, K.E., Angelopoulos, M., Huang, W.-S., Halle, S., … SPIE-The International Society for Optical Engineering	12 国際会議録 Bottom antireflective coatings (BARCs) for 157-nm lithography He, L., Puligadda, R., Lowes, J., Rich, M.D. SPIE-The International Society for Optical Engineering

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