Evaluation of electron-beam stabilization for ion implant processing
- 著者名:
Buffat, S. J. ( ZiLOG ) Kickel, B. ( ZiLOG ) Philipps, B. ( ZiLOG ) Adams, J. ( ZiLOG ) Ross, M. F. ( AlliedSignal Inc. ) Minter, J. P. ( AlliedSignal Inc. ) Marlowe, T. ( AlliedSignal Inc. ) Wong, S. S. ( AlliedSignal Inc. ) - 掲載資料名:
- Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3678
- 発行年:
- 1999
- 開始ページ:
- 1157
- 終了ページ:
- 1174
- 総ページ数:
- 18
- 出版情報:
- Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431523 [0819431524]
- 言語:
- 英語
- 請求記号:
- P63600/3678-2
- 資料種別:
- 国際会議録
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