Recent progress in 193-nm antireflective coatings
- 著者名:
Meador, J. D. ( Brewer Science, Inc. ) Guerrero, D. J. ( Brewer Science, Inc. ) Xu, G. ( Brewer Science, Inc. ) Shao, X. ( Brewer Science, Inc. ) Dobson, N. ( Brewer Science, Inc. ) Claypool, J. ( Brewer Science, Inc. ) Nowak, K. ( Brewer Science, Inc. ) - 掲載資料名:
- Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3678
- 発行年:
- 1999
- 開始ページ:
- 800
- 終了ページ:
- 809
- 総ページ数:
- 10
- 出版情報:
- Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431523 [0819431524]
- 言語:
- 英語
- 請求記号:
- P63600/3678-2
- 資料種別:
- 国際会議録
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3
国際会議録
Deep-ultraviolet antireflective coating with improved conformality,optical density,and etch rate
SPIE-The International Society for Optical Engineering |
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