Line-edge roughness characterized by polymer aggregates in photoresists
- 著者名:
- Yamaguchi, T. ( NTT Basic Research Labs. (Japan) )
- Namatsu, H. ( NTT Basic Research Labs. (Japan) )
- Nagase, M. ( NTT Basic Research Labs. (Japan) )
- Kurihara, K. ( NTT Basic Research Labs. (Japan) )
- Kawai, Y. ( NTT System Electronics Labs. (Japan) )
- 掲載資料名:
- Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3678
- 発行年:
- 1999
- 開始ページ:
- 617
- 終了ページ:
- 624
- 総ページ数:
- 8
- 出版情報:
- Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431523 [0819431524]
- 言語:
- 英語
- 請求記号:
- P63600/3678-1
- 資料種別:
- 国際会議録
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4
国際会議録
Generation mechanism of surface roughness in resists: free volume effect on surface roughness
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |