Acid diffusion and evaporation in chemically amplified resists
- 著者名:
- Kim, J. -B. ( Korea Advanced Institute of Science and Technology )
- Kwon, Y. -G. ( Korea Advanced Institute of Science and Technology )
- Choi, J. -H. ( Korea Advanced Institute of Science and Technology )
- Jung, M. -H. ( Korea Advanced Institute of Science and Technology )
- 掲載資料名:
- Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3678
- 発行年:
- 1999
- 開始ページ:
- 536
- 終了ページ:
- 543
- 総ページ数:
- 8
- 出版情報:
- Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431523 [0819431524]
- 言語:
- 英語
- 請求記号:
- P63600/3678-1
- 資料種別:
- 国際会議録
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