Carbon-rich cyclopolymers: their synthesis, etch resistance, and application to 193-nm microlithography

Carbon-rich cyclopolymers: their synthesis, etch resistance, and application to 193-nm microlithography

著者名:

Pasini, D. ( Univ. of California/Berkeley )

Low, E. ( Univ. of California/Berkeley )

Meagley, R. P. ( Univ. of California/Berkeley )

Frechet, J. M. J. ( Univ. of California/Berkeley )

Willson, C. G. ( Univ. of Texas at Austin )

Byers, J. D. ( International SEMATECH )

さらに 1 件

掲載資料名:

Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3678

発行年:

1999

開始ページ:

94

終了ページ:

103

総ページ数:

10

出版情報:

Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819431523 [0819431524]

言語:

英語

請求記号:

P63600/3678-1

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014620
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Microlithography
回次:	1999 : 16th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1999.03.15-1999.03.17

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