Chemically amplified resists based on the norbornene copolymers with steroid derivatives
- 著者名:
Kim, J. -B. ( Korea Advanced Institute of Science and Technology ) Lee, B. -W. ( Korea Advanced Institute of Science and Technology ) Kang, J. -S. ( Korea Advanced Institute of Science and Technology ) Kim, S. -J. ( Korea Kumho Petrochemical Co., Ltd. ) Park, J. -H. ( Korea Kumho Petrochemical Co., Ltd. ) Seo, D. -C. ( Korea Kumho Petrochemical Co., Ltd. ) Balk, K. -H. ( Hyundai Electronics Industries Co., Ltd. (Korea) ) Jung, J. -C. ( Hyundai Electronics Industries Co., Ltd. (Korea) ) Roh, C. -H. ( Hyundai Electronics Industries Co., Ltd. (Korea) ) - 掲載資料名:
- Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3678
- 発行年:
- 1999
- 開始ページ:
- 36
- 終了ページ:
- 43
- 総ページ数:
- 8
- 出版情報:
- Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431523 [0819431524]
- 言語:
- 英語
- 請求記号:
- P63600/3678-1
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
8
国際会議録
Diffusion parameter analysis for chemical amplification resists as a function of resist process
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
9
国際会議録
Environmentally stable chemically amplified positive resist containing vinyllactam terpolymers
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |