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Expanding Thermal Plasma Deposition Of Silicon Dioxide-Like Films For Microelectronic Devices

著者名:
掲載資料名:
Amorphous and heterogeneous silicon-based films - 2002 : symposium held April 2-5, 2002, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
715
発行年:
2002
開始ページ:
101
終了ページ:
110
総ページ数:
10
出版情報:
Warrendale: Materials Research Society
ISSN:
02729172
ISBN:
9781558996519 [1558996516]
言語:
英語
請求記号:
M23500/715
資料種別:
国際会議録

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