Spectroscopic Ellipsometry as a Potential In-Line Optical Metrology Tool For Relative Porosity Measurements of Low- K Dielectric Films
- 著者名:
Edwards, N.V. Vella, J. Xie, Q. Zollner, S. Werho, D. Adhihetty, I. Liu, R. Tiwald, T.E. Russell, C. Vires, J. Junker, K.H. - 掲載資料名:
- Surface engineering 2001 - fundamentals and applications : symposium held November 26-29, 2001, Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 697
- 発行年:
- 2002
- 開始ページ:
- 101
- 終了ページ:
- 106
- 総ページ数:
- 6
- 出版情報:
- Warrendale, Penn: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558996335 [1558996338]
- 言語:
- 英語
- 請求記号:
- M23500/697
- 資料種別:
- 国際会議録
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12
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Measurement of rutile TiO2 dielectric tensor from 0.148 to 33ヲフm using generalized ellipsometry
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