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A Study on the Behavior of Water Absorption of SiOF Thin Films Deposited by Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition Method

著者名:
掲載資料名:
Thin films : stresses and mechanical properties IX : symposium held November 26-30, 2001, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
695
発行年:
2002
開始ページ:
245
終了ページ:
250
総ページ数:
6
出版情報:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558996311 [1558996311]
言語:
英語
請求記号:
M23500/695
資料種別:
国際会議録

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