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Ion Implantation Induced Interdiffusion in Quantum Wells for Optoelectronic Device Integration

著者名:
Fu, L.
Tan, H.H.
Cohen, M.I.
Jagadish, C.
Dao, L.V.
Gal, M.
Li, Na
Li, Ning
Liu, X.
Lu, W.
Shen, S.C.
さらに 6 件
掲載資料名:
Progress in semiconductor materials for optoelectronic applications : symposium held November 26-29, 2001, Boston, Massachusetts, U.S.A
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
692
発行年:
2002
開始ページ:
599
終了ページ:
606
総ページ数:
8
出版情報:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558996281 [1558996281]
言語:
英語
請求記号:
M23500/692
資料種別:
国際会議録

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