Low Temperature Preparation of High-Quality Pb(Zr,Ti)O3 Films by Metal Organic Chemical Vapor Deposition With High Reproducibility
- 著者名:
Funakubo, Hiroshi Nagashima, Kuniharu Aratani, Masanori Tokita, Kouji Oikawa, Takahiro Ozeki, Tomohiko Asano, Gouji Saito, Keisuke - 掲載資料名:
- Ferroelectric Thin Films X : symposium held November 25-29, 2001, Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 688
- 発行年:
- 2002
- 開始ページ:
- 3
- 終了ページ:
- 14
- 総ページ数:
- 12
- 出版情報:
- Warrendale, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558996243 [1558996249]
- 言語:
- 英語
- 請求記号:
- M23500/688
- 資料種別:
- 国際会議録
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9
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Growth of Epitaxial Site-Engineered Bi4Ti3O12-Based Thin Films by MOCVD and Their Characterization
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