Mechanism for the Reduction of Threading Dislocation Densities in Si0.82Ge0.18 Films on Silicon on Insulator Substrates

Mechanism for the Reduction of Threading Dislocation Densities in Si0.82Ge0.18 Films on Silicon on Insulator Substrates

著者名:

掲載資料名:

Dislocations and deformation mechanisms in thin films and small structures : symposium held April 17-19, 2001, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

673

発行年:

2001

総ページ数:

6

出版情報:

Warrendale, PA: Materials Research Society

ISSN:

02729172

ISBN:

9781558996090 [1558996095]

言語:

英語

請求記号:

M23500/673

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014556
シリーズID:	PA00000011
会議名:	Symposium On Dislocations and Deformation Mechanisms in Thin Films and Small Structures
回次:	2001
会議開催地:	San Francisco, CA, USA
会議開催年:	2001.04.17-2001.04.19

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