Comparison Study for TiN Films Deposited from Different Method: Chemical Vapor Deposition and Atomic Layer Deposition

Comparison Study for TiN Films Deposited from Different Method: Chemical Vapor Deposition and Atomic Layer Deposition

著者名:

Kim, Byoung-Youp

掲載資料名:

Mechanisms of surface and microstructure evolution in deposited films and film structures : symposium held April 17-20, 2001, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

672

発行年:

2001

総ページ数:

6

出版情報:

Warrendale, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558996083 [1558996087]

言語:

英語

請求記号:

M23500/672

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014555
シリーズID:	PA00000011
会議名:	Symposium On Mechansims of Surface and Microstructure Evolution in Deposited Films and Film Structures
回次:	2001
会議開催地:	San Francisco, CA, USA
会議開催年:	2001.04.17-2001.04.20

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