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Direct Formation of C54 Phase on the Basis of C40 TiSi2 and Its Applications in Deep Sub-Micron Technology

著者名:
Chen, S.Y.
Shen, Z.X.
Xu, S.Y.
See, A.K.
Chan, L.H.
Li, W.S.
さらに 1 件
掲載資料名:
Gate stack and silicide issues in silicon processing II : symposium held April 17-19, 2001, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
670
発行年:
2002
総ページ数:
6
出版情報:
Warrendale, PA: Materials Research Society
ISSN:
02729172
ISBN:
9781558996069 [1558996060]
言語:
英語
請求記号:
M23500/670
資料種別:
国際会議録

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