Internal Stress of ITO, IZO and GZO Films Deposited by rf and dc Magnetron Sputtering

Internal Stress of ITO, IZO and GZO Films Deposited by rf and dc Magnetron Sputtering

著者名:

Sasabayashi, T.

掲載資料名:

Transport and microstructural phenomena in oxide electronics : symposium held April 16-20, 2001, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

666

発行年:

2001

総ページ数:

6

出版情報:

Warrendale, PA: Materials Research Society

ISSN:

02729172

ISBN:

9781558996021 [1558996028]

言語:

英語

請求記号:

M23500/666

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014549
シリーズID:	PA00000011
会議名:	Symposium on transport and microstructural phenomena in oxide electronics
回次:	2001
会議開催地:	San Francisco, CA, USA
会議開催年:	2001.04.16-2001.04.20

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