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Films and Devices Deposited by HWCVD at Ultra High Deposition Rates

著者名:
Mahan, A.H.
Xu, Y.
Iwaniczko, E.
Williamson, D.L.
Beyer, W.
Perkins, J.D.
Vanecek, M.
Gedvilas, L.M.
Nelson, B.P.
さらに 4 件
掲載資料名:
Amorphous and heterogeneous silicon-based films - 2001 : symposium held April 16-20, 2001, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
664
発行年:
2001
総ページ数:
6
出版情報:
Warrendale: Materials Research Society
ISSN:
02729172
ISBN:
9781558996007 [1558996001]
言語:
英語
請求記号:
M23500/664
資料種別:
国際会議録

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