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Growth of (Ba,Sr)TiO3 Thin Films in a Multi-Wafer MOCVD Reactor

著者名:
Fitsilis, F.
Ehrhart, P.
Regnery, S.
Waser, R.
Schinle, F.
Schumacher, M.
Jia, C.L.
Jin, H.Z.
Juergensen, H.
さらに 4 件
掲載資料名:
Ferroelectric thin films IX : symposium held November 26-30, 2000, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
655
発行年:
2001
総ページ数:
6
出版情報:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558995659 [155899565X]
言語:
英語
請求記号:
M23500/655
資料種別:
国際会議録

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