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Highly Stable Ir-Ta-O Electrode for Ferroelectric Material Deposition

著者名:
Zhang, Fengyan
Hsu, Sheng Teng
Maa, Jer-Shen
Ono, Yoshi
Hong, Ying
Zhuang, Weiwei
Ohnishi, Shigeo
Zhen, Wendong
Fujiwara, Norito
さらに 4 件
掲載資料名:
Ferroelectric thin films IX : symposium held November 26-30, 2000, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
655
発行年:
2001
総ページ数:
6
出版情報:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558995659 [155899565X]
言語:
英語
請求記号:
M23500/655
資料種別:
国際会議録

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