Low Temperature Growth of Polycrystalline Film of Silicon-Rich Silicon-Germanium by Reactive Thermal Chemical Vapor Deposition
- 著者名:
- 掲載資料名:
- Microcrystalline and nanocrystalline semiconductors-2000 : symposium held November 27-30, 2000, Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 638
- 発行年:
- 2001
- 総ページ数:
- 6
- 出版情報:
- Warrendale, PA.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558995482 [155899548X]
- 言語:
- 英語
- 請求記号:
- M23500/638
- 資料種別:
- 国際会議録
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