Feasibility of Detecting Barrier Layer to Low-K Transition in Copper CMP Using Raman Spectroscopy
- 著者名:
Kondoju, S. Juncker, C. Lucas, P. Raghavan, S. Fischer, P. Moinpour, M. Oehler, A. - 掲載資料名:
- Chemical-mechanical planarization - integration technology and realiability : symposium held March 28-31, 2005, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 867
- 発行年:
- 2005
- 開始ページ:
- 175
- 終了ページ:
- 182
- 総ページ数:
- 8
- 出版情報:
- Warrendale, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558998209 [1558998209]
- 言語:
- 英語
- 請求記号:
- M23500/867
- 資料種別:
- 国際会議録
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