Gate Oxide Integrity for Polysilicon Thin-Film Transistors: A Comparative Study for ELC, MILC, and SPC Crystallized Active Polysilicon Layer
- 著者名:
Choi, D.C. Choi, B.D. Jung, J.Y. Park, H.H. Seo, J.W. Lee, K.Y. Chung, H.K. - 掲載資料名:
- Amorphous and nanocrystalline silicon science and technology - 2005 : symposium held March 28-April 1, 2005, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 862
- 発行年:
- 2005
- 開始ページ:
- 647
- 終了ページ:
- 652
- 総ページ数:
- 6
- 出版情報:
- Warrendale, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558998155 [1558998152]
- 言語:
- 英語
- 請求記号:
- M23500/862
- 資料種別:
- 国際会議録
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