Effect of growth parameters on refractive index and film composition of plasma enhanced chemical vapor deposition silicon oxynitride films

Effect of growth parameters on refractive index and film composition of plasma enhanced chemical vapor deposition silicon oxynitride films

著者名:

Naskar, S.

掲載資料名:

Solid-state chemistry of inorganic materials V : symposium held November 29-December 2, 2004, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

848

発行年:

2005

開始ページ:

171

終了ページ:

176

総ページ数:

6

出版情報:

Warrendale, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558997967 [1558997962]

言語:

英語

請求記号:

M23500/848

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014501
シリーズID:	PA00000011
会議名:	Symposium on solid-state chemistry of inorganic materials
回次:	5th
会議開催地:	Boston, MA, USA
会議開催年:	2004.11.29-2004.12.02

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