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Understanding Adhesion Failure in Low-k Dielectric Stack During Chemical-Mechanical Polishing

著者名:
掲載資料名:
Thin films : stresses and mechanical properties X : symposium held December 1-5, 2003, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
795
発行年:
2002
開始ページ:
131
終了ページ:
136
総ページ数:
6
出版情報:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558997332 [1558997334]
言語:
英語
請求記号:
M23500/795
資料種別:
国際会議録

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