Fabrication of Nanotips and Microbeams in Antimonide Based Semiconductor Material Using Bromine Ion Beam Assisted Etching
- 著者名:
Krejca, B. Vangala, S.R Krishnaswami, K. Kolluru, R. Ospina, M.C. Sung, C. Goodhue, W.D. - 掲載資料名:
- Radiation effects and ion-beam processing of materials : symposium held December 1-5, 2003, Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 792
- 発行年:
- 2004
- 開始ページ:
- 309
- 終了ページ:
- 314
- 総ページ数:
- 6
- 出版情報:
- Warrendale, PA: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558997301 [155899730X]
- 言語:
- 英語
- 請求記号:
- M23500/792
- 資料種別:
- 国際会議録
類似資料:
1
国際会議録
Preparation and Patterning of GaSb Surfaces With Br-IBAE for Antimonide Based Molecular Beam Epitaxy
Materials Research Society |
7
国際会議録
Unique Capabilities of Chemically-Assisted Ion-Beam Etching for Compound Semiconductor Devices
Electrochemical Society |
Materials Research Society |
SPIE - The International Society of Optical Engineering |
Materials Research Society |
9
国際会議録
ION/NEUTRAL BEAM ASSISTED ETCHING OF SEMICONDUCTORS: CHEMICAL MODIFICATIONS OF THE ADSORBED PHASE
Materials Research Society |
Materials Research Society |
SPIE-The International Society for Optical Engineering |
Materials Research Society |
Materials Research Society |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |