Modeling of Pattern Density Dependent Pressure Non-Uniformity at a Die Scale for ILD Chemical Mechanical Planarization

Modeling of Pattern Density Dependent Pressure Non-Uniformity at a Die Scale for ILD Chemical Mechanical Planarization

著者名:

掲載資料名:

Advances in chemical-mechanical polishing : symposium held April 13-15, 2004, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

816

発行年:

2004

開始ページ:

101

終了ページ:

106

総ページ数:

6

出版情報:

Warrendale, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558997660 [1558997660]

言語:

英語

請求記号:

M23500/816

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014458
シリーズID:	PA00000011
会議名:	Symposium on advances in chemical-mechanical polishing
回次:	2004
会議開催地:	San Francisco, CA, USA
会議開催年:	2004.04.13-2004.04.15

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